Market Overview
The Atomic Layer Deposition Market is expected to grow at a CAGR of 7.1% during the forecast period (2024-2031).
Atomic layer deposition is a technique performed in the vapour phase, which is used to deposit thin films onto a substrate. The majority of the ALD reactions are performed using two chemicals called precursors. Numerous chemicals are made to react with the surface material during a reaction, and all the steps are performed that create a thin film.
ALD is in greater demand for products such as data storage devices and small electronic components and displays, where the film thickness is imperative. Owing to such a wide application range, ALD becomes a popular tool for developing nano-coatings, thin films and fabricating semiconductor devices. Apart from this, ALD applications include deposition of the gate oxide, microelectronics, deposition transition-metal nitrides, metal films, etc.
Market Summary
| Metrics | Details |
| Market CAGR | 7.1% |
| Segments Covered | By Type, By End-User and By Region |
| Report Insights Covered | Competitive Landscape Analysis, Company Profile Analysis, Market Size, Share, Growth, Demand, Recent Developments, Mergers and acquisitions, New Product Launches, Growth Strategies, Revenue Analysis, and Other key insights. |
| Fastest Growing Region | Asia Pacific |
| Largest Market Share | North America |
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Market Dynamics
The global atomic layer deposition market is driven by the massive demand for the product in semiconductor & power converting systems. ALD is gaining popularity in biomedical applications for creating flexible sensing devices. Also, ALD is increasingly being used in lithium batteries as it can store a large amount of energy in a compact size.
Massive demand for the product in semiconductor & power converting systems
The ALD market is driven by increasing electronic industries and semiconductor solutions in various global parts. ALD plays a vital role in the fabrication of microelectronics due to its excellent ability to produce accurate thickness and uniform surface coupled with a high quality of film production using various materials.
ALD is a potential technique used to deposit high k-memory capacitor dielectrics, high k-gate oxides, ferroelectric, and metals for electrodes and interconnects. The demand for semiconductors is expected to accelerate by increasing the demand of automotive industry's growing demand for electronic components in the automotive industry and directly boosting the ALD market.
Apart from these, several products such as MOSFET gate stacks, DRAM capacitors, magnetic recording heads, nonvolatile ferroelectric memories, and others use ALD as the primary technique. For instance, in 2017, Forge Nano announced its assembly exclusive intellectual property right to produce safer and longer Li-ion battery products. The company used its breakthrough high throughput ALD coating technology.
ALD is gaining popularity in biomedical applications for creating flexible sensing devices
Understanding the surface properties of biomedical devices is the most critical step in the biomedical industry, especially in targeting devices that are going to be implanted in the body. ALD currently plays a vital role in various biomedical sectors, such as modifying nanoporous membranes, creating flexible sensors, creating thin biocompatible coating, and polymer ALD. The ALD technology is used to deposit TiO2 films to create optical waveguide sensors used as diagnostic tools.
Besides, ALD helps create flexible sensing devices used in athletes' clothing for moment detection or heart rate. Therefore the above-mentioned prime applications of ALD in biomedical sectors are expected to build a massive market in the coming tenure due to growing advancements in technology and rising demand for biomedical in recent times. For instance, in 2015, Oxford Instruments announced its acquisition of Platinum Medical Imaging. The acquisition aims to offer the lease and service of mobile medical imaging labs.
The technique's high cost, low reaction time, and unwanted chemical reactions haALD market's growth led the market.
Attain the high purity of the substrate leads to an increase in the cost of the product. The ALD process's cost increment is generally due to increasing run trials required before getting the conditions that favour their desired product. Therefore, there is no set cost for running a cycle of ALD instruments; the cost varies and depends on the substrate's quality and purity coupled with temperature and machine operation time. Thus, some substrates are less available than others, requiring special conditions that directly affect the technique's cost.
The ALD process is also very time-consuming and is a critical limitation hindering the ALD market's growth. Apart from this, sometimes precursors might be volatile but are not subject to decomposition. Various precursors are very sensitive to air/oxygen, thus becoming the major limitation for substrates that may be used for further processing. Thus high cost, low reaction time, and chemical reactions hamper the growth of ALD in recent times, and the momentum is expected to maintain in the forecast period.
Report Metrics
The majority of businesses are shut down, and operations across several end-users of atomic layer deposition products such as electronics, medical, solar, and semiconductor industries are also compromised, thus dropping the product's global demand in 2020.
Market Segmentation Analysis
The global atomic layer deposition market is segmented on type, product, application, and region.
The high application range, especially in silicon solar cells industries, easy availability, and the substrates' stability, makes aluminium oxide the dominating segment of the ALD market.
In terms of product, the ALD market is segmented into aluminium oxide, plasma-enhanced, catalytic, metal and others. From the segments mentioned above, aluminium oxide is expected to dominate the global market of ALD in the forecast period. ALD process based on aluminium oxide is the most convenient method used to produce thin-film coatings coupled with tailored physical properties, making it a vital product for the ALD market.
Aluminium oxide films target application areas such as insulating layers and dielectric layers and dictate a significant market share in the global market. Apart from these, aluminium oxides' easy availability is another factor making this global segment player in the ALD market. Aluminium oxide films acquire the technology's significant share due to excellent characteristics, stability to numerous substrates, and optimal base metal prices.
For instance, in September 2020, Law Research Corporation announced the advanced Striker FE platform's launch. It is a new processing solution for manufacturing high aspect ratio chip architectures. The platforms use ICEFill technology to fill extreme DRAM structures, 3D NAND, and logic devices at emerging nodes.
Market Geographical Share
Rising demand from different users such as semiconductors, electronics, solar sector, and medical equipment industry and dominant market of electrical and electronics is building the ALD business in the Asia-Pacific.
Asia-Pacific region topped the ALD 2016 market and is expected to maintain the forecast period's momentum due to rapidly growing demand from different users such as semiconductors, electronics, solar and medical equipment. The dominant market of electrical and electronics in South Korea is expected to proliferate the global market of ALD in the coming years.
The growing demand for solar panel manufacturing and installations in countries like China, Japan, India, and Indonesia is more likely to boost the Asia-Pacific region's ALD market. On the other, North America is expected to grow in the coming years, U.S and Canada being the major contributors to the market. The growing semiconductor and consumer electrics industry in the region is the prime factor triggering the market's growth.
Companies and Competitive Landscape
The atomic layer deposition market is highly fragmented with the presence of limited global companies. Some of the key players contributing to the market's growth include Lam Research Corporation, Applied Materials Inc, ASM International NV, KLA Corporation, Tokyo Electron, Hitachi Kokusai Electric Inc, Novellus Systems Inc, Oxford Instruments plc, Cambridge NanoTech Inc, Sigma-Aldrich and among others.
The major players adopt several growth strategies such as product launches, acquisitions, and collaborations, contributing to the atomic layer deposition market's global growth. However, the players in this market follow product launch as the key growth strategy. For instance, in 2018, Picosun announced the PicoMedical solution for the healthcare sector, and with this new launch, complete y is planning to target the healthcare market.
Law Research Corporation
Overview: The company is the trusted collaborative partner of the world's leading semiconductor companies founded in 1980, headquarters in Fremont, California. The company is the fundamental enabler of the silicon roadmap and is currently engaged in developing the advanced chip. The company's Wafer fabrication equipment and services allow the chipmaker to build a smaller, faster, and better performing electronic device.
Product Portfolio: The company has a product portfolio of atomic layer deposition that includes:
- Striker FE platform is the latest memory, logic, and imaging device that requires fragile, highly conformal dielectric film for continued device performance improvement and scaling. The product plays a vital role in Etch stop layers, gap fill dielectrics, patterning spacer, and maks.
Key Development:
- In September 2020, Law Research Corporation announced the launch of the advanced Striker FE platform. It is a new processing solution for manufacturing high aspect ratio chip architectures. The platforms use ICEFill technology for filling extreme structures in DRAM, 3D NAND, and logic devices at emerging nodes.
The global atomic layer deposition market report would provide access to an approx: 59 market data tables, 61 figures, and 180 pages.
